摘要： 以SnCl₄、SbCl₃、NaOH 等为原料，采用共沉淀法制备 ATO半导体颜料，采用 XRD、SEM、EDS对颜料结构、成分、形貌进行表征，比较了ATO半导体颜料与常见的单组分颜料涂层红外发射率大小。通过颜色混合规律将 ATO半导体颜料与着色颜料混合制备了绿色伪装涂料，制备的涂层具有较低的红外发射率，并且其光谱反射曲线满足美军标的光谱通道要求，具有较好的应用前景。

关键词: 共沉淀法, ATO半导体颜料, 红外发射率, 光谱反射率, 伪装涂料

Abstract:

Semiconductor ATO pigment were prepared by a co-precipition of SnCl₄、SbCl₃、NaOH. The structure, composition and the surface morphology of the pigments prepared were characterized by X-ray diffraction, energy dispersive spectra and scanning electronic microscope. The infrared emisivity of the coatings was lower than that of coatings made by conventional pigments. The colour mix law was used to prepare the green camouflage coatings, which showed low infrared emissivity, by the use of ATO semiconductor pigment and conventional pigments. At the same time, the reflectance of camouflage coatings can meet the requirements of America Military Specifications, proriding great application prospect.

Key words: co-precipition method, ATO semiconductor pigments, infrared emissivity, spectrum reflectance;camouflage coatings