Abstract: The effects of the substrate roughness, phosphating process, electrophoresis technology and other factors on the roughness of the ultra-high throwing power electrophoresis coating were investigated. The results showed that the roughness of electrophoresis coating increased with the increase of the substrate roughness. When the substrate roughness gave the Ra>1.5 μm, the electrophoresis coating could be improved by polishing substrate. The roughness of electrophoresis coating on the phosphated substrate was lower than that of the coating on the untreated substrate. The pH value of water washing solution after phosphatir process was controlled within an appropriate range (pH>4. 5)based on specific production requirements.Furthermore, optimization of coating line, electrophoretic voltage, Soft start time and electrophoresis process could decrease significantly the roughness of electrophoresis coating.

Key words: electrophoresis film, roughness, substrate, phosphating film, technological parameter

摘要： 研究了板材粗糙度、磷化工艺、电泳工艺等因素对超高泳透力电泳涂膜粗糙度的影响。结果表明:电泳涂膜粗糙度随板材粗糙度增大而增大,板材粗糙度Ra>1.5μm时,打磨板材可改善电泳涂膜粗糙度;有磷化膜的电泳涂膜粗糙度比无磷化膜的粗糙度低,磷化后水洗pH也应根据生产要求控制在合适的范围(pH>4.5);涂装现场需选择合适的过线方式、电泳电压及软启动时间,优良的电泳工艺可明显降低电泳涂膜粗糙度。

关键词: 电泳涂膜, 粗糙度, 板材, 磷化膜, 工艺参数