Abstract: It was necessary to form anti-water coating on the surface of photoresist toprevent the interaction between photoresist and water in ArF immersion lithography. Anti-water coating played an important role in resolution，process window，and defect of photoresist. And balancing the hydrophobic and alkaline solubility of anti-water coating wasthe key and difficult point in the designing of polymer structure. In this review，the methods and mechanisms of anti-water coating formation were analyzed，the advantages and disadvantages between different methods were compared. And the anti-water coating polymerswere categorized and summarized based on their functional groups and alkaline solubility. Thestructure and performance of anti-water coating polymers were focused，especially the effectsof steric and hydrogen bonding on hydrophobicity of coating were highlighted. Finally，the application and development prospects were briefly discussed.

Key words: ArF immersion lithography, anti-water coating, hydrophobic and alkaline solubility, polymer structure

摘要： 氟化氩（ArF）浸没式光刻需在光刻胶表面形成抗水涂层，阻挡光刻胶和水之间组分交换。抗水涂层对光刻胶的分辨率、工艺窗口、低缺陷要求起着重要作用，平衡抗水涂层的疏水性和碱溶性是设计聚合物结构的重点和难点。分析了形成抗水涂层的方法和成膜机理，对比了不同方法的优缺点，根据聚合物所含官能团及其碱溶性，对抗水涂层聚合物进行了分类总结，重点阐述抗水涂层聚合物的结构和性能要求，尤其关注了聚合物侧链的位阻效应和氢键作用对涂层的疏水性影响。最后对抗水涂层的应用和发展进行了展望。

关键词: ArF浸没式光刻, 抗水涂层, 疏水和碱溶性, 聚合物结构

CLC Number: 

• TQ635. 9