In this study，using hydroxydiphenylketone，2-mercaptobenzoxazole，and aromatic acyl chloride as starting materials，a novel hydroxydiphenylketone derivative and thioester derivatives with benzoxazole were efficiently synthesized through a simple and mild approach. The compounds were characterized by using ¹H NMR， ¹³C NMR，and HR-MS. Optical properties were evaluated，and the derivatives were employed in the production of UV-resistant photocurable coatings. Both derivatives effectively absorbed UV light（220-350 nm），exhibited good compatibility，and were odorless. The hydroxydiphenylketone derivative，as a photoinitiator，significantly reduced coating curing time to 9 seconds，improved appearance， adhesion，and gel content compared to the commercial photoinitiator BP. Thioester derivatives was used as UV absorbers，not only enhance UV resistance but also simplify manufacturing and storage of photocurable coatings. The coating formulation showed promise in various applications，including topcoats，inks，and adhesives.