Developing cationic photopolymerizable fluorosilicone monomers is one of theimportant research directions in the field of photopolymerization. A fluorosilicone glycidyl ether epoxy monomer（FSi-GE）was synthesized by using readily available raw materials and simple synthesis process，and the monomer structure was characterized using NMR andFT-IR. The influence of FSi-GE on polymerization kinetics，surface water resistance，heat resistance and tensile properties of the cationic photopolymerization system comprised of3，4-epoxy-cyclohexyl methyl 3，4-epoxy-cyclohexyl formate（E4221）and 1，2-epoxy-4-vinylcyclohexane（VOH）was investigated. The results showed that when FSi-GE amount was increased from 0 to 0. 5%，the final conversion of epoxy group of the system was increased from 60. 6% to 65. 7%，the surface water contact angle was increased from 56. 9° to 104. 6°，the elongation at break was increased from 22. 96% to 41. 22%，and the heat resistance was also improved. However，with the further increase of FSi-GE amount，the surface water contact angle，heat resistance and elongation at break presented a slightly decreasing，which indicated that the appropriate FSi-GE amount could effectively improve the final conversion， hydrophobicity，heat resistance and mechanical properties of E4221/VOH system.