摘要： 开发可阳离子光聚合的氟硅单体是光聚合领域重要的研究方向。利用易得的原料和简单的工艺合成了一种氟硅缩水甘油醚环氧单体（ FSi-GE）采用核磁共振波谱仪（ NMR）和傅立叶变换红外光谱仪（ FT-IR）对该单体的结构进行了表征，并研究了，其对环氧单体 3，4-环氧环己基甲基 3，4-环氧环己基甲酸酯（ E4221）和 1，2-环氧 .4-乙烯基环己烷（ VOH）组成的阳离子光聚合体系的光聚合动力学、表面疏水性、耐热性及拉伸性能的影响。结果表明：当 FSi-GE的添加量从 0增加到 0. 5%，体系的环氧基团最终转化率从 60. 6%上升到 65. 7%，固化膜表面水接触角从 56. 9°升至 104. 6°，断裂伸长率从 22. 96%升至 41. 22%，同时耐热性提高。但随着 FSi-GE的含量继续增加，表面水接触角、耐热性和断裂伸长率都呈现略微下降的趋势。说明加入适量的 FSi-GE能够有效提高 E4221/VOH体系的最终转化率、疏水性、耐热性和机械性能。

关键词: 阳离子光聚合, 氟硅单体, 缩水甘油醚环氧单体

Abstract: Developing cationic photopolymerizable fluorosilicone monomers is one of theimportant research directions in the field of photopolymerization. A fluorosilicone glycidyl ether epoxy monomer（FSi-GE）was synthesized by using readily available raw materials and simple synthesis process，and the monomer structure was characterized using NMR andFT-IR. The influence of FSi-GE on polymerization kinetics，surface water resistance，heat resistance and tensile properties of the cationic photopolymerization system comprised of3，4-epoxy-cyclohexyl methyl 3，4-epoxy-cyclohexyl formate（E4221）and 1，2-epoxy-4-vinylcyclohexane（VOH）was investigated. The results showed that when FSi-GE amount was increased from 0 to 0. 5%，the final conversion of epoxy group of the system was increased from 60. 6% to 65. 7%，the surface water contact angle was increased from 56. 9° to 104. 6°，the elongation at break was increased from 22. 96% to 41. 22%，and the heat resistance was also improved. However，with the further increase of FSi-GE amount，the surface water contact angle，heat resistance and elongation at break presented a slightly decreasing，which indicated that the appropriate FSi-GE amount could effectively improve the final conversion， hydrophobicity，heat resistance and mechanical properties of E4221/VOH system.

Key words: cationic photopolymerization, fluorosilicone monomer, glycidyl ether epoxy monomer

中图分类号: 

• TQ637. 83