以羟基二苯甲酮、 2-巯基苯并噁唑、芳基酰氯为原料，采用简单、温和的方法合成了新型二苯甲酮衍生物和含苯并噁唑的硫酯类衍生物，采用核磁氢谱 ¹H NMR、核磁碳谱 ¹³C NMR和高分辨质谱 HRMS等测试手段对目标化合物进行表征，并对其进行了光学性能测试，并用其制备了具有抗紫外线功能的光固化涂料。结果表明：两类衍生物能有效吸收 220~350 nm的紫外光，与低聚物、单体相容性好，无气味。新合成的二苯甲酮衍生物作为光引发剂可使涂层固化时间大幅缩短到 9s，固化膜的外观、附着力和凝胶率相较于市售光引发剂 BP有明显提高；硫酯类衍生物作为紫外吸收剂不仅能够增加光固化涂层的抗紫外线功能，且易于光固化涂料的制造、贮存。该组合物在罩面剂、油墨、胶黏剂等领域也有良好的应用前景。

In this study，using hydroxydiphenylketone，2-mercaptobenzoxazole，and aromatic acyl chloride as starting materials，a novel hydroxydiphenylketone derivative and thioester derivatives with benzoxazole were efficiently synthesized through a simple and mild approach. The compounds were characterized by using ¹H NMR， ¹³C NMR，and HR-MS. Optical properties were evaluated，and the derivatives were employed in the production of UV-resistant photocurable coatings. Both derivatives effectively absorbed UV light（220-350 nm），exhibited good compatibility，and were odorless. The hydroxydiphenylketone derivative，as a photoinitiator，significantly reduced coating curing time to 9 seconds，improved appearance， adhesion，and gel content compared to the commercial photoinitiator BP. Thioester derivatives was used as UV absorbers，not only enhance UV resistance but also simplify manufacturing and storage of photocurable coatings. The coating formulation showed promise in various applications，including topcoats，inks，and adhesives.